Silicon dioxide (SiO ₂) plays a crucial role in the semiconductor industry. As the main substrate material for silicon wafers, the high purity and stability of silicon dioxide make it an ideal choice for manufacturing integrated circuits and microelectronic devices. This article will explore in detail the key role and importance of silicon dioxide in the semiconductor industry.
Firstly, silicon dioxide is used as an insulating layer in the semiconductor manufacturing process. In the manufacturing of integrated circuits, silicon dioxide thin films are used as insulation materials to isolate different circuit layers. Its high insulation and chemical stability prevent short circuits or interference between circuit layers, ensuring the normal operation of the circuit. In addition, silicon dioxide thin films can be precisely patterned through photolithography technology to form complex circuit structures.
Secondly, silicon dioxide is used as a gate dielectric in semiconductor devices. In metal oxide semiconductor field-effect transistors (MOSFETs), a silicon dioxide film serves as the gate dielectric, controlling the current between the source and drain electrodes. Its high dielectric constant and low leakage current characteristics make MOSFETs have high switching speed and low power consumption, making them the core components of modern electronic devices.
In addition, silicon dioxide is also used to manufacture protective layers for semiconductor devices. After the completion of chip manufacturing, silicon dioxide film is used as a protective layer to prevent the surface of the chip from being contaminated and damaged by the external environment. Its high hardness and chemical inertness enable the chip to operate stably for a long time in harsh environments.